Semiconductor Equipment & Materials
Wafer Fabrication – Thin Film and Advanced Packaging Process
DWL 2000 GS / DWL 4000 GS
The most advanced industrial grayscale lithography tool on the market.
• Fast and flexible high-resolution pattern generators.
• Optimized for industrial-level Grayscale Lithography
• Designed for high-throughput patterning of masks and wafers
• For integrated circuits, MEMS, micro-optic and microfluidic devices, sensors, holograms, and security features on banknotes and ID cards.
• Patterning of complex 2.5D structures in thick photoresist over large areas.
• Suitable for wafer-level micro-optics used for telecommunications, illumination, and industrial display manufacturing, as well as for device fabrication in life sciences.
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DWL 66⁺
Most versatile system for research and prototyping with variable resolution and wide selection of options.
• High-resolution direct-write pattern generator.
• Choice of 6 write modes with 2 laser wavelengths
• Ideal for research and development (R&D) in microelectronics, MEMS, microfluidics, sensors, non-standard substrates, advanced packaging — virtually any academic application that requires microstructure fabrication.
• Stands out with its Grayscale Exposure Mode which creates complex 2.5D microstructures such as micro-optics for mobile applications, diffractive optical elements (DOE), computer-generated holograms, and structured surfaces.
• It is a highly flexible and customizable system that precisely matches the requirements of your applications.
• Key features of the DWL 66⁺ are a high-resolution mode, front- and backside alignment, absolute position calibration and an automatic loading system.
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MLA 150
The fastest maskless aligner for R&D, rapid prototyping, and small production volumes.
• State-of-the-art Maskless Aligner Lithography tool.
• Fast automated front- and backside alignment procedures and outstanding speed.
• Areas of application include MEMS, micro-optics, diffractive optical elements, sensors, electronic components, and other devices for materials and life sciences.
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MLA 300
Optimized for flexible industrial production with highest precision and seamless integration into industrial production lines.
• High throughput, a simplified workflow, and integration with manufacturing execution systems (MES).
• Used for the production of sensors and sensor ICs, MEMS, and microfluidic devices.
• Full automation with customizable loading options, software designed for production environments, and patented substrate tracking technology.
• Modularity enables fast maintenance, replacement, or repair. Real-time autofocus compensates for substrate warp or corrugations, ensuring flawless patterning.
• High resolutions of 2 µm lines and spaces at the high throughput and high availability expected in production.
• Integration Customizable workflow “wizards” to start exposure jobs, and integration to a central MES via SECS/GEM or OPC-UA protocols.
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NanoFrazor
The versatile and modular nanolithography tool.
• Groundbreaking commercial system for Thermal Scanning Probe Lithography(t-SPL).
• Easy patterning of nanostructures even with complex geometries; minimum lateral features 15 nm, vertical resolution 2 nm.
• Markerless overlay and stitching accuracy 25 nm specified, sub-10 nm overlay shown.
• Areas of application include Quantum devices, 1D/2D materials, Photonics and Biotechnology.
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μMLA
Configurable and compact tabletop maskless aligner.
• State-of-the-art in maskless technology built on the renowned µPG platform.
• Entry-level research and development (R&D) tool for virtually any application requiring microstructures.
• Typical examples are Microfluidics, Micro Optics, Sensors, MEMS, and Material Science.
• Flexible and customizable tool.
For more information, please click here.
For more information, please visit www.heidelberg-instruments.com.